Ion Density Distribution in an Inductively Coupled Plasma Chamber
- 1 April 2004
- journal article
- Published by IOP Publishing in Plasma Science and Technology
- Vol. 6 (2), 2233-2236
- https://doi.org/10.1088/1009-0630/6/2/009
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Electron temperature analysis of two-gas-species inductively coupled plasmaApplied Physics Letters, 2001
- Stabilizing inductively coupled plasma source impedance and plasma uniformity using a Faraday shieldJournal of Vacuum Science & Technology A, 2001
- Numerical Investigation on the Flow and Temperature Fields in an Inductively Coupled Plasma ReactorPlasma Science and Technology, 2000
- Electron energy control in an inductively coupled plasma at low pressuresApplied Physics Letters, 2000