Use of electron beam lithography to selectively decompose metalorganics into patterned thin-film superconductors
- 8 August 1988
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 53 (6), 526-528
- https://doi.org/10.1063/1.100625
Abstract
Fine line superconductors, approximately 5 μm in width and 260 nm thick, were formed from Y‐Ba‐Cu on ⟨100⟩SrTiO3 by the combined methods of metalorganic deposition and selective area electron beam exposure. The lines were written in metal neodecanoates using an electron beam having a spot size of 0.25 μm and an energy of 25 kV. The dosage of the exposure was 1200 μC/cm2. Unexposed areas were removed with a 30 s xylene wash. A 500 °C pyrolysis in air for 300 s followed by rapid thermal annealing in oxygen produced lines having superconducting onsets above 90 K and zero resistance at 69 KKeywords
This publication has 19 references indexed in Scilit:
- Use of ion beams to decompose metalorganics into patterned thin-film superconductorsApplied Physics Letters, 1988
- Micropatterning of high T c films with an excimer laserApplied Physics Letters, 1988
- Superconductivity up to 114 K in the Bi-Al-Ca-Sr-Cu-O compound system without rare-earth elementsPhysical Review Letters, 1988
- Direct laser writing of superconducting patterns of Y1Ba2Cu3O7−δApplied Physics Letters, 1988
- Geometrical Phases from Global Gauge Invariance of Nonlinear Classical Field TheoriesPhysical Review Letters, 1988
- Reactive ion beam etching of Y-Ba-Cu-O superconductorsApplied Physics Letters, 1988
- Superconductivity above 90 K in the square-planar compound system A with A=Y, La, Nd, Sm, Eu, Gd, Ho, Er and LuPhysical Review Letters, 1987
- Superconductivity at 93 K in a new mixed-phase Y-Ba-Cu-O compound system at ambient pressurePhysical Review Letters, 1987
- Metal deposition by electron beam exposure of an organometallic filmApplied Physics Letters, 1986
- Possible highT c superconductivity in the Ba?La?Cu?O systemZeitschrift für Physik B Condensed Matter, 1986