Characteristic X-ray excitation in thin films by 4–50 keV electron bombardment
- 1 October 1975
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 29 (2), 223-236
- https://doi.org/10.1016/0040-6090(75)90192-3
Abstract
No abstract availableKeywords
This publication has 17 references indexed in Scilit:
- Sensitivity in trace-element analysis by p, α and 16O induced X-raysNuclear Instruments and Methods, 1974
- Proton induced X-ray emission as a tool for trace element analysisNuclear Instruments and Methods, 1974
- Sub-monolayer detection by electron microprobe analysisJournal of Physics D: Applied Physics, 1973
- A simple method of thin film analysis in the electron probe microanalyserJournal of Physics D: Applied Physics, 1973
- The determination of thin layer thicknesses with an electron microprobeSurface Science, 1973
- The Monte Carlo technique as applied to the fundamentals of EPMA and SEMJournal of Applied Physics, 1972
- Tiefenverteilung der Anregung charakteristischer Röntgenstrahlung in Kupfer durch 12 bis 30 keV-ElektronenThe European Physical Journal A, 1971
- Use of electron microprobe analysis to determine layer thicknesses down to the monolayer rangePhysica Status Solidi (a), 1970
- Prediction of X-Ray Production and Electron Scattering in Electron-Probe Analysis Using a Transport EquationJournal of Applied Physics, 1969
- Sur les bases physiques de l'analyse ponctuelle par spectrographie XJournal de Physique et le Radium, 1955