Radiofrequency plasma decomposition of C n F2n+2-H2 and CF4-C2F4 mixtures during Si etching or fluoropolymer deposition
- 1 March 1984
- journal article
- Published by Springer Nature in Plasma Chemistry and Plasma Processing
- Vol. 4 (1), 1-14
- https://doi.org/10.1007/bf00567367
Abstract
No abstract availableKeywords
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