Iodinated polystyrene: An ion‐millable negative resist
- 1 November 1980
- journal article
- research article
- Published by Wiley in Polymer Engineering & Science
- Vol. 20 (16), 1054-1057
- https://doi.org/10.1002/pen.760201603
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Photochemistry of ring‐substituted polystyrenes. II. Photolyses of poly(p‐fluoro‐, p‐chloro‐, and p‐bromostyrene)sJournal of Polymer Science: Polymer Chemistry Edition, 1979
- Chloromethylated Polystyrene as a Dry Etching‐Resistant Negative Resist for Submicron TechnologyJournal of the Electrochemical Society, 1979
- PGMA as a High Resolution, High Sensitivity Negative Electron Beam ResistJapanese Journal of Applied Physics, 1979
- Experimental Observations of Nearly Monodisperse Polystyrene as Negative Electron ResistsJournal of the Electrochemical Society, 1979
- Negative electron resists for direct fabrication of devicesJournal of Vacuum Science and Technology, 1978
- Molecular parameters and lithographic performance of poly(glycidyl methacrylate-co-ethyl acrylate): A negative electron resistJournal of Vacuum Science and Technology, 1975
- Synthesis and Some Reactions of Polystyrene IodosoacetateThe Journal of the Society of Chemical Industry, Japan, 1961