Atomic mixing in ion impact: A collision cascade model
- 1 August 1981
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 39 (3), 288-290
- https://doi.org/10.1063/1.92675
Abstract
No abstract availableKeywords
This publication has 14 references indexed in Scilit:
- Distortion of depth profiles during sputtering: I. General description of collisional mixingNuclear Instruments and Methods, 1980
- Recoil mixing in solids by energetic ion beamsNuclear Instruments and Methods, 1980
- Depth dependence of atomic mixing by ion beamsApplied Physics Letters, 1979
- A theoretical treatment of cascade mixing in depth profiling by sputteringPhysics Letters A, 1979
- The depth resolution of sputter profilingApplied Physics A, 1979
- Ion-beam-induced silicide formationApplied Physics Letters, 1979
- Ion-induced silicide formation in niobium thin filmsRadiation Effects, 1979
- Ion-beam-induced atomic mixingJournal of Applied Physics, 1977
- Alloying of thin palladium films with single crystal and amorphous siliconPhysica Status Solidi (a), 1973
- Super ranges of fast ions in copper single crystalsPhysics Letters, 1963