Annealing of residual stress in silicon monoxide films
- 1 October 1961
- journal article
- Published by IOP Publishing in British Journal of Applied Physics
- Vol. 12 (10), 580-581
- https://doi.org/10.1088/0508-3443/12/10/127
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Annealing silicon monoxide films on aluminium mirrorsBritish Journal of Applied Physics, 1960
- Vacuum deposition of dielectric films for capacitorsVacuum, 1959
- Stress Annealing in Vacuum Deposited Copper FilmsProceedings of the Physical Society. Section B, 1957
- Outgassing of GlassJournal of Applied Physics, 1955