NaCl-Type Oxide Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition
- 1 October 1993
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 32 (10A), L1448
- https://doi.org/10.1143/jjap.32.l1448
Abstract
Thin films of MgO, NiO and CoO with NaCl-type structure were prepared by plasma-enhanced metalorganic chemical vapor deposition using metal acetylacetonato complexes as source materials. Soda-lime glass, Si(111), stainless steel and fused silica were used as the substrates. X-ray diffraction patterns indicated that (100) preferred-orientation NaCl-type oxide films were obtained at substrate temperatures of 150°C or above, independent of the kind of substrate. Scanning electron microscopy images showed that each film had a smooth surface and a columnar structure with growth perpendicular to the film surface.Keywords
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