The influence of the physicochemical characteristics of the substrate surface on the deposited TiN film properties
- 1 September 1988
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 163, 309-316
- https://doi.org/10.1016/0040-6090(88)90441-5
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
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- High Rate Thick Film GrowthAnnual Review of Materials Science, 1977