The interaction of 5 KeV electrons with polymers of methyl isopropenyl ketone
- 1 July 1974
- journal article
- research article
- Published by Wiley in Polymer Engineering & Science
- Vol. 14 (7), 518-524
- https://doi.org/10.1002/pen.760140711
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- Photochemistry of Ketone Polymers. X. Chain Scission Reaction in the Solid StateMacromolecules, 1973
- Polymethyl Methacrylate as an Electron Sensitive ResistJournal of the Electrochemical Society, 1973
- Exposure of PhotoresistsJournal of the Electrochemical Society, 1970
- Electron Resists for Microcircuit and Mask ProductionJournal of the Electrochemical Society, 1969
- Electron Beam Exposure of PhotoresistsJournal of the Electrochemical Society, 1965
- Radiolysis of polymethyl isopropenyl ketoneJournal of Polymer Science, 1960
- The Photolysis of Polymethylvinyl Ketone and Polymethyl Isopropenyl Ketone1Journal of the American Chemical Society, 1959
- The photolysis of polymethylvinylketone. I. Reactions and kineticsProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1955
- Structure of Vinyl Polymers. XII.1 The Polymer of Methyl Isopropenyl KetoneJournal of the American Chemical Society, 1942
- Über hochpolymere Verbindungen, 102. Mitteil.: Über Poly‐isopropenyl‐methyl‐ketonBerichte der deutschen chemischen Gesellschaft (A and B Series), 1934