Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism
- 1 March 2001
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 172 (1-2), 148-158
- https://doi.org/10.1016/s0169-4332(00)00842-4
Abstract
No abstract availableKeywords
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