On the formation of BN films by ion beam and vapor deposition
- 1 June 1988
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 33 (1-4), 678-680
- https://doi.org/10.1016/0168-583x(88)90658-1
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
- Properties of boron nitride coating films prepared by the ion beam and vapor deposition method (IVD)Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1987
- Nitride film formation by ion and vapour depositionNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- Formation of Cubic Boron Nitride Films by Boron Evaporation and Nitrogen Ion Beam BombardmentJapanese Journal of Applied Physics, 1983
- Ion beam deposition of special film structuresJournal of Vacuum Science and Technology, 1981
- Structure and properties of quasi-amorphous films prepared by ion beam techniquesThin Solid Films, 1980
- NH Cu Cl ( I Cl ) , a New Highly Conducting Solid ElectrolyteJournal of the Electrochemical Society, 1980
- Electrical and Optical Properties of rf-Sputtered GaN and InNApplied Physics Letters, 1972
- Preparation and Properties of Thin Film Boron NitrideJournal of the Electrochemical Society, 1968