Pulsed UV laser Raman spectroscopy of silane in a linear-flow chemical vapor deposition reactor
- 15 February 1983
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 42 (4), 395-397
- https://doi.org/10.1063/1.93919
Abstract
For the first time, spatially resolved relative concentrations of silane inside a chemical vapor deposition reactor have been measured with spontaneous Raman spectroscopy using the third harmonic of a Q-switched neodymium:yttrium aluminum garnet laser. Concentration profiles were obtained under both atmospheric and low total pressure conditions. Considerable depletion of silane in the gas phase was observed.Keywords
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