Mechanism of chemical vapor deposition of silicon
- 1 April 1981
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 52, 213-218
- https://doi.org/10.1016/0022-0248(81)90196-2
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
- Laser-induced vapor deposition of siliconApplied Physics Letters, 1979
- Mechanisms of chemical vapor deposition of siliconJournal of Crystal Growth, 1978
- Inelastic light scattering studies of silicon chemical vapor deposition (CVD) systemsJournal of Crystal Growth, 1975
- Chemical Processes in Vapor Deposition of Silicon: I . Deposition from and Etching byJournal of the Electrochemical Society, 1975
- Chemical Processes in Vapor Deposition of Silicon: II . Deposition from andJournal of the Electrochemical Society, 1975
- Matrix-Isolation Study of the Vacuum-Ultraviolet Photolysis of Trichlorosilane. The Infrared Spectrum of the Free Radical SiCl3The Journal of Chemical Physics, 1968
- Matrix-Isolation Study of the Vacuum–Ultraviolet Photolysis of Dischlorosilane. The Infrared Spectrum of the Free Radical SiCl2The Journal of Chemical Physics, 1968