Fabrication of Integrated Chip with Microinductors and Micro-Tunable Capacitors by Complementary Metal–Oxide–Semiconductor Postprocess
- 1 April 2005
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 44 (4R), 2030-2036
- https://doi.org/10.1143/jjap.44.2030
Abstract
In this study, we investigate the fabrication of integrated chips with microinductors and a micro-tunable capacitor using the standard 0.35 mu m single polysilicon four-metal (SPFM) complementary metal-oxide-semiconductor (CMOS) and a postprocess. Two inductors-planar spiral and conical spiral-are fabricated and tested. The postprocess has two main steps: One step is the removal of a metal from sacrificial layers and the etching holes in structures using phosphoric acid. The other is the etching of a silicon substrate using tetramethyl ammonium hydroxide (TMAH) to increase the distance between the inductors and the silicon substrate, thereby reducing substrate loss and increasing the quality (Q) factor of the inductors. Experimental results show that the maximum Q factors of the conical spiral and planar spiral inductors were 4.6 at 3.5 GHz and 4.7 at 4 GHz, respectively, following the postprocess. The self-resonance frequency of the conical spiral inductor exceeded that of the planar spiral inductorKeywords
This publication has 10 references indexed in Scilit:
- A novel linearly tunable MEMS variable capacitorJournal of Micromechanics and Microengineering, 2001
- Accurate modeling of high-Q spiral inductors in thin-film multilayer technology for wireless telecommunication applicationsIEEE Transactions on Microwave Theory and Techniques, 2001
- Physical modeling of spiral inductors on siliconIEEE Transactions on Electron Devices, 2000
- Surface micromachined solenoid on-Si and on-glass inductors for RF applicationsIEEE Electron Device Letters, 1999
- Micromachined electro-mechanically tunable capacitors and their applications to RF IC'sIEEE Transactions on Microwave Theory and Techniques, 1998
- On-chip spiral inductors with patterned ground shields for Si-based RF ICsIEEE Journal of Solid-State Circuits, 1998
- Study of integrated RF passive components performed using CMOS and Si micromachining technologiesJournal of Micromechanics and Microengineering, 1997
- High Q CMOS-compatible microwave inductors using double-metal interconnection silicon technologyIEEE Microwave and Guided Wave Letters, 1997
- CMOS foundry-based micromachiningJournal of Micromechanics and Microengineering, 1996
- A planar micromachined spiral inductor for integrated magnetic microactuator applicationsJournal of Micromechanics and Microengineering, 1993