Melting threshold of crystalline and amorphized Si irradiated with a pulsed ArF (193 nm) excimer laser
- 1 April 1988
- journal article
- solids and-materials
- Published by Springer Nature in Applied Physics A
- Vol. 45 (4), 361-364
- https://doi.org/10.1007/bf00617943
Abstract
No abstract availableKeywords
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