The morphology and size of nanostructured Cu, Pd and W generated by sputtering
- 31 December 1992
- journal article
- Published by Elsevier in Nanostructured Materials
- Vol. 1 (6), 491-504
- https://doi.org/10.1016/0965-9773(92)90082-9
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- The production of nanocrystalline powders by magnetron sputteringJournal of Applied Physics, 1990
- Measurement of angular distribution of noble metals by low keV ion sputteringSurface Science, 1988
- Nucleation and growth of thin filmsVacuum, 1988
- Optical constants and associated functions of metastable diamondlike amorphous carbon films in the energy range 0.5–7.3 eVJournal of Applied Physics, 1986
- Attempt to form hydride and amorphous particles, and introduction of a new evaporation methodSurface Science, 1985
- The thermalization of energetic atoms during the sputtering processJournal of Vacuum Science & Technology A, 1984
- Formation of Ultrafine Metal Particles by Gas-Evaporation Technique. IV. Crystal Habits of Iron and Fcc Metals, Al, Co, Ni, Cu, Pd, Ag, In, Au and PbJapanese Journal of Applied Physics, 1977
- Ultrafine metal particlesJournal of Applied Physics, 1976
- Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatingsJournal of Vacuum Science and Technology, 1974
- Formation of Ultrafine Metal Particles by Gas Evaporation Technique. I. Aluminium in HeliumJapanese Journal of Applied Physics, 1973