The preparation of cubic boron nitride films by reactive diode sputtering
- 1 August 1987
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 151 (2), 243-249
- https://doi.org/10.1016/0040-6090(87)90238-0
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- Preparation and characterization of ion-plated boron nitrideThin Solid Films, 1986
- Structure and chemical composition of RF-sputtered boron nitride filmsPhysica Status Solidi (a), 1985
- Ion beam synthesis of cubic boron nitrideJournal of Vacuum Science & Technology A, 1983
- Structural and Electronic Characterization of Discharge-Produced Boron NitrideJapanese Journal of Applied Physics, 1983
- Preparation and properties of hard i-C and i-BN coatingsThin Solid Films, 1982
- Deposition of wurtzite type boron nitride layers by reactive pulse plasma crystallizationJournal of Crystal Growth, 1979