Stress relief structures for ion-beam projection lithography masks
- 31 May 1999
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 46 (1-4), 481-484
- https://doi.org/10.1016/s0167-9317(99)00045-3
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Stencil mask distortion control using nonsymmetric perforation ringsMicroelectronic Engineering, 1998
- Pattern placement errors in mask membranesJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1997