Tri-layer systems for nanoimprint lithography with an improved process latitude
- 30 June 2000
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 53 (1-4), 175-178
- https://doi.org/10.1016/s0167-9317(00)00290-2
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Multilayer resist methods for nanoimprint lithography on nonflat surfacesJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1998
- Very low contrast X-ray masks for high resolution printingMicroelectronic Engineering, 1998
- Sub-10 nm imprint lithography and applicationsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1997
- Imprint of sub-25 nm vias and trenches in polymersApplied Physics Letters, 1995