Comparison of two new microwave plasma sources for HF chemical lasers
- 1 January 1978
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Journal of Quantum Electronics
- Vol. 14 (1), 8-11
- https://doi.org/10.1109/jqe.1978.1069660
Abstract
The performances of two microwave sources used to produce fluorine atoms by dissociation of SF6for a CW hydrogen fluoride chemical laser are compared. The first device, large microwave plasma (LMP), is a slow-wave structure while, the other (surfatron) excites a plasma surface wave. Their performances, as far as electrical and chemical efficiencies are concerned, are quite similar when operated at the same microwave power level. However, the slow-wave structure can sustain higher microwave power, providing larger laser output power, while the surfatron has much smaller dimensions, allowing for a more compact laser system.Keywords
This publication has 7 references indexed in Scilit:
- A continuous HF chemical laser: Production of fluorine atoms by a microwave dischargeJournal of Applied Physics, 1977
- Compact continuous HF microwave-discharge mixing laserJournal of the Optical Society of America, 1975
- A Small Microwave Plasma Source for Long Column Production without Magnetic FieldIEEE Transactions on Plasma Science, 1975
- Operation of a small single-mode stable cw hydrogen fluoride laserJournal of Applied Physics, 1974
- Design and Performance Characteristics of A Small Subsonic Flow HF Chemical LaserReview of Scientific Instruments, 1973
- WB4--A spectroscopic study of CW chemical lasersIEEE Journal of Quantum Electronics, 1973
- The Large Volume Microwave Plasma Generator (LMP™): A New Tool for Research and Industrial Processing*The Journal of Microwave Power, 1972