Capacitance and conductance deep level transient spectroscopy in field-effect transistors
- 20 January 1986
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 48 (3), 227-229
- https://doi.org/10.1063/1.96565
Abstract
An analysis of conductance transients in field-effect transistors for small values of drain-source voltage is presented which enables absolute values of trap concentration to be evaluated. The relationships use parameters which can be easily measured as distinct from the estimated values of mobility profiles used in previously published calculations. Excellent quantitative agreement between capacitance and conductance results on large area gallium arsenide field-effect transistors has been obtained. In addition, conductance deep level transient studies have demonstrated that the method of measurement and analysis can be used for micron and submicron devices which are much too small for capacitive measurements.Keywords
This publication has 5 references indexed in Scilit:
- A modeling technique for characterizing ion-implanted material using C–V and DLTS dataSolid-State Electronics, 1984
- Calculation of deep state profiles from transient capacitance dataApplied Physics Letters, 1982
- Stability of performance and interfacial problems in GaAs MESFET'sIEEE Transactions on Electron Devices, 1980
- Electrical traps in GaAs microwave f.e.t.sElectronics Letters, 1976
- Schottky-barrier capacitance measurements for deep level impurity determinationSolid-State Electronics, 1973