The effect of ion implantation on r.f.-sputtered TiB2 films
- 1 July 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 81 (1), 13-19
- https://doi.org/10.1016/0040-6090(81)90498-3
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Ion bombardment of group IV elemental metal and synthetic nitride filmsThin Solid Films, 1979
- Deuterium and helium ion irradiation effects on TiB2 coatingsThin Solid Films, 1979
- Surface hardening of beryllium by ion implantationThin Solid Films, 1979
- Ion Microanalysis and Implantation Applied to Fusion Surface ResearchIEEE Transactions on Nuclear Science, 1979
- Preparation and compositional analysis of sputtered TaN filmsJournal of Applied Physics, 1978
- Fabrication and characterization of vapor-deposited niobium and zirconium carbidesThin Solid Films, 1977
- Thin film formation of In2O3, TiN, and TaN by rf reactive ion platingJournal of Vacuum Science and Technology, 1975
- Activated Reactive Evaporation Process for High Rate Deposition of CompoundsJournal of Vacuum Science and Technology, 1972
- Approximations and interpolation rules for ranges and range stragglingsRadiation Effects, 1970
- Effect of ion bombardment on the adhesion of aluminium films on glassThin Solid Films, 1969