The barrier height and interface effect of Au-n-GaN Schottky diode
- 14 June 1995
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 28 (6), 1169-1174
- https://doi.org/10.1088/0022-3727/28/6/021
Abstract
Schottky barrier contact using Au and ohmic contact using Al were made on n-GaN grown by hydride vapour phase epitaxy. The diodes were characterized in the range 77-373 K. Under forward bias, the ideality parameter n=1.04 and the threshold voltage is 1.1 V. The reverse bias leak current is below 10-9 A on a reverse bias of -10 V. The temperature-dependence of the I-V characteristics shows two regimes of forward current transport: one at low voltage governed by thermionic emission and the high-voltage regime due to spatial inhomogeneities at the metal-semiconductor interface. The barrier height phi B and the electron affinity XS were determined to be 0.91 and 4.19 eV, respectively, by I-V measurement; and 1.01+or-0.02 and 4.09 eV, respectively, by C-V measurement. The results have been discussed.Keywords
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