The interaction of As4and Ga beams on a GaAs(100) surface

Abstract
A model is proposed to explain the various kinetic processes occurring at a GaAs (100) surface when beams of As4 and Ga are used to grow GaAs by molecular beam epitaxy. There is a considerable amount of data available on this particular system and an attempt has been made to logically examine the fundamental surface processes and explain them by a semi-empirical model. Reasonable quantitative agreement with experiment, in the temperature range 450-600K, is achieved for much of the experimental data.