Atomic Layer Deposition of Hafnium and Zirconium Oxides Using Metal Amide Precursors
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- 21 September 2002
- journal article
- research article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 14 (10), 4350-4358
- https://doi.org/10.1021/cm020357x
Abstract
No abstract availableThis publication has 28 references indexed in Scilit:
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