Thermally stimulated ionic conduction in MOS (MoSiO2Si) structures
- 31 October 1977
- journal article
- Published by Elsevier in Journal of Electrostatics
- Vol. 3 (1-3), 203-212
- https://doi.org/10.1016/0304-3886(77)90092-4
Abstract
No abstract availableKeywords
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