Reflection electron microscope study of the initial stages of oxidation of Si(111)-7 × 7 surfaces
- 31 December 1985
- journal article
- Published by Elsevier in Ultramicroscopy
- Vol. 18 (1-4), 453-461
- https://doi.org/10.1016/0304-3991(85)90165-2
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- Pulsed laser atom-probe study of clean and oxygen-covered siliconApplications of Surface Science, 1982
- Possible oxygen chemisorption configurations on the Si(lll) 2×1 surfaceJournal of Vacuum Science and Technology, 1981
- Direct observation of the phase transition between the (7 × 7) and (1 × 1) structures of clean (111) silicon surfacesSurface Science, 1981
- Image contrast of dislocations and atomic steps on (111) silicon surface in reflection electron microscopySurface Science, 1981
- Reflection electron microscopy of clean and gold deposited (111) silicon surfacesSurface Science, 1980
- Oxygen on cleaved silicon (111): Effects of atomic steps and residual gasesSurface Science, 1980
- Electron-spectroscopic studies of the early stages of the oxidation of SiPhysical Review B, 1979
- Electron orbital energies of oxygen adsorbed on silicon surfaces and of silicon dioxidePhysical Review B, 1974
- The adsorption of oxygen on silicon (111) surfaces. ISurface Science, 1973
- Measurements of oxygen adsorption on Si(111) surfaces by LEEDSurface Science, 1969