A review of nitrogen trifluoride for dry etching in microelectronics processing
- 28 February 1985
- journal article
- review article
- Published by Elsevier in Microelectronics Journal
- Vol. 16 (1), 5-21
- https://doi.org/10.1016/s0026-2692(85)80121-x
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
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