Preparation and characterization of fluorinated indium tin oxide films prepared by r.f. sputtering
- 1 July 1991
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 202 (1), 77-82
- https://doi.org/10.1016/0040-6090(91)90543-7
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- The influence of deposition parameters on the optical and electrical properties of r.f.-sputter- deposited indium tin oxide filmsThin Solid Films, 1986
- Preparation and characterization of indium tin oxide films produced by the d.c. sputtering techniqueThin Solid Films, 1985
- Transparent conductors—A status reviewThin Solid Films, 1983
- Fluorine-doped SnO2 films for solar cell applicationSolar Cells, 1981