First-Principles Study of the Etching Reactions of HF and H2O with Si/SiO2 Surfaces
- 24 October 1993
- journal article
- Published by Springer Science and Business Media LLC in MRS Proceedings
- Vol. 315 (1), 437-446
- https://doi.org/10.1557/proc-315-437
Abstract
No abstract availableKeywords
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