Simulation of lithographic images and resist profiles
- 1 April 1990
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 11 (1-4), 629-632
- https://doi.org/10.1016/0167-9317(90)90185-v
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Focus : The Critical Parameter For Submicron Optical Lithography :Part 2Published by SPIE-Intl Soc Optical Eng ,1987
- A general simulator for VLSI lithography and etching processes: Part I—Application to projection lithographyIEEE Transactions on Electron Devices, 1979
- Modeling projection printing of positive photoresistsIEEE Transactions on Electron Devices, 1975
- Applications of Coherence Theory in Microscopy and Interferometry*Journal of the Optical Society of America, 1957