Internal stress in aluminium oxide, titanium carbide and copper films obtained by planar magnetron sputtering
- 1 March 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 78 (1), 41-48
- https://doi.org/10.1016/0040-6090(81)90416-8
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
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