Current-Voltage Characteristic of Reactive Sputtering with Element Targets
- 16 July 1979
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 54 (1), K23-K26
- https://doi.org/10.1002/pssa.2210540160
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Magnetron sputtering: basic physics and application to cylindrical magnetronsJournal of Vacuum Science and Technology, 1978
- D.C. cathode sputtering: influence of the oxygen content in the gas flow on the discharge currentThin Solid Films, 1976
- Mechanism of rf reactive sputteringJournal of Applied Physics, 1975