Thermal stability and decomposition kinetics of amorphous hydrogenated films
- 15 October 1979
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 63 (1), 189-193
- https://doi.org/10.1016/0040-6090(79)90124-x
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- A SIMS analysis of deuterium diffusion in hydrogenated amorphous siliconApplied Physics Letters, 1978
- Hydrogen bonding in silicon-hydrogen alloysPhilosophical Magazine Part B, 1978
- Infrared and Raman spectra of the silicon-hydrogen bonds in amorphous silicon prepared by glow discharge and sputteringPhysical Review B, 1977
- Schottky-barrier characteristics of metal–amorphous-silicon diodesApplied Physics Letters, 1976
- Amorphous silicon solar cellApplied Physics Letters, 1976