The influence of chemically active gas on the light emission of metallic targets bombarded by positive ions
- 1 August 1975
- journal article
- research article
- Published by Springer Nature in Applied Physics A
- Vol. 7 (4), 313-320
- https://doi.org/10.1007/bf00900329
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- The theoretical and experimental study of the ionization processes during the low energy ion sputteringSurface Science, 1974
- Influence de la chimisorption de l'oxygéne et l'azote sur l'émission ionique secondaire d'échantillons monocristallins de nickel et d'alliage nickel-chromeSurface Science, 1973
- A quantum-mechanical model for the ionization and excitation of atoms during sputteringSurface Science, 1973
- Secondary ion yields near 1 for some chemical compoundsPhysics Letters A, 1972
- Émission ionique secondaire des alliages cuivre-aluminium en présence d'oxygèneJournal de Physique, 1971
- Influence de l'adsorption de monocouches de nature connue sur l'$eacute$mission $eacute$lectronique cin$eacute$tique et sur la r$eacute$flexion ionique d'une cible de molybd$egrave$ne bombard$eacute$e par des ions de gaz raresJournal of Physics D: Applied Physics, 1970
- Collisions of Ar+ ions with surface Cu atoms and charge exchange of scattered ions near the metal surfacePhysica, 1969
- Luminescence of particles produced in the process of scattering of hydrogen ions at the surface of metallic targetsPhysics Letters A, 1968
- Distributions énergétique et angulaire de l'émission ionique secondaire. III. Distribution angulaire et rendements ioniquesJournal de Physique, 1968
- Fermi Surface of NiJournal of the Physics Society Japan, 1964