Field ion microscope studies of transition metal adatom diffusion on (110), (211) and (321) tungsten surfaces
- 1 May 1970
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 3 (5), 707-716
- https://doi.org/10.1088/0022-3727/3/5/309
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
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- A calculation of relaxation, migration and formation energies for surface defects in copperSurface Science, 1968
- Atomic Binding of Transition Metals on Clean Single-Crystal Tungsten SurfacesThe Journal of Chemical Physics, 1968
- Binding and Field Desorption of Individual Tungsten AtomsThe Journal of Chemical Physics, 1968
- Atomic Displacements in One- and Two-Dimensional DiffusionThe Journal of Chemical Physics, 1966
- Atomic View of Surface Self-Diffusion: Tungsten on TungstenThe Journal of Chemical Physics, 1966
- The thermal stability and rearrangement of field-evaporated tungsten surfacesProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1965
- Determination of the Surface Tension and Surface Migration Constants for TungstenPhysical Review B, 1960
- Experimentieren mit atomaren Kristallbausteinen im FeldionenmikroskopZeitschrift für Elektrochemie, Berichte der Bunsengesellschaft für physikalische Chemie, 1957