Atomic layer growth of SiO2 on Si(100) using SiCl4 and H2O in a binary reaction sequence
- 10 July 1995
- journal article
- Published by Elsevier in Surface Science
- Vol. 334 (1-3), 135-152
- https://doi.org/10.1016/0039-6028(95)00471-8
Abstract
No abstract availableKeywords
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