Annealing kinetics of sputtered gold-tungsten and gold-molybdenum films
- 1 December 1973
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 44 (12), 5259-5265
- https://doi.org/10.1063/1.1662140
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Internal stresses and resistivity of low-voltage sputtered tungsten filmsJournal of Applied Physics, 1973
- Structural Investigation of Thin FilmsJournal of Vacuum Science and Technology, 1970
- Metallization systems for silicon integrated circuitsProceedings of the IEEE, 1969
- Beam-Lead TechnologyBell System Technical Journal, 1966
- Expanded contacts and interconnexions to monolithic silicon integrated circuitsSolid-State Electronics, 1965
- The effect of segregation on the solute diffusion enhancement due to the presence of dislocationsActa Metallurgica, 1960
- On the role of dislocations in bulk diffusionActa Metallurgica, 1957
- Quantitative X-ray diffraction observations on strained metal aggregatesProgress in Metal Physics, 1952
- A Correction for the 1 2Doublet in the Measurement of Widths of X-ray Diffraction LinesJournal of Scientific Instruments, 1948
- An experimental investigation of extrapolation methods in the derivation of accurate unit-cell dimensions of crystalsProceedings of the Physical Society, 1945