Validation and accuracy of software for peak synthesis in XPS
- 31 August 1998
- journal article
- Published by Elsevier in Journal of Electron Spectroscopy and Related Phenomena
- Vol. 95 (1), 71-93
- https://doi.org/10.1016/s0368-2048(98)00204-7
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Surface chemical analysis: Comparing and exchanging dataJournal of Vacuum Science & Technology A, 1997
- Quantitative AES IV: Accuracy of the Numerical Evaluation of Peak Areas in AES using the Universal Tongaard Background Subtraction MethodSurface and Interface Analysis, 1996
- Curve fitting in surface analysis and the effect of background inclusion in the fitting processJournal of Vacuum Science & Technology A, 1996
- Random uncertainties in AES and XPS: I: Uncertainties in peak energies, intensities and areas derived from peak synthesisSurface and Interface Analysis, 1992
- Random uncertainties in AES and XPS: II: Quantification using either relative or absolute measurementsSurface and Interface Analysis, 1992
- VAMAS Surface chemical analysis standard data transfer format with skeleton decoding programsSurface and Interface Analysis, 1988
- Quantitative analysis of the inelastic background in surface electron spectroscopySurface and Interface Analysis, 1988
- Quantitative analysis of reflection electron energy loss spectra of aluminumSolid State Communications, 1986
- X-ray photoelectron spectroscopic studies of electrode surfaces using a new controlled transfer techniqueJournal of Electroanalytical Chemistry and Interfacial Electrochemistry, 1979
- High-Resolution X-Ray Photoemission Spectrum of the Valence Bands of GoldPhysical Review B, 1972