Spin localization in Si:P—direct evidence fromNMR
- 3 August 1987
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 59 (5), 578-581
- https://doi.org/10.1103/physrevlett.59.578
Abstract
The normalized intensities of the NMR spectra in Si:P decrease when the phosphorous content is lowered through the concentration for the metal-insulator transition. The NMR shift is maximum for ≃1.1 and becomes very small for n≃. For n≃1.2 electronic susceptibility χ on the observed nuclei does not follow the T variation of the macroscopic susceptibility but has all the characteristics expected for a Pauli electron gas. Already above , disorder and correlations therefore induce spin localization on an inhomogeneous scale in uncompensated semiconductors.
Keywords
This publication has 21 references indexed in Scilit:
- Spin Dynamics of Nearly Localized ElectronsPhysical Review Letters, 1986
- Enhancement of the spin susceptibility in disordered interacting electrons and the metal-insulator transitionPhysical Review B, 1986
- Low temperature anomalies of spin susceptibility in heavily phosphorus doped siliconSolid State Communications, 1985
- Critical exponent of the metal-insulator transitionPhilosophical Magazine Part B, 1985
- Disordered electronic systemsReviews of Modern Physics, 1985
- Spins in Si: P Close to the Metal-Insulator TransitionPhysical Review Letters, 1985
- Metal-insulator transitions in non-crystalline systemsAdvances in Physics, 1985
- Metal-insulator transition in a doped semiconductorPhysical Review B, 1983
- NMR Study on Electronic States in Phosphorus Doped SiliconJournal of the Physics Society Japan, 1978
- Application of Gutzwiller's Variational Method to the Metal-Insulator TransitionPhysical Review B, 1970