Studies of thin-film growth of sputtered hydrogenated amorphous silicon
- 30 November 1982
- journal article
- Published by Elsevier in Solar Energy Materials
- Vol. 8 (1-3), 187-204
- https://doi.org/10.1016/0165-1633(82)90062-4
Abstract
No abstract availableKeywords
This publication has 21 references indexed in Scilit:
- Hydrogenated amorphous silicon carbide as a window material for high efficiency a-Si solar cellsSolar Energy Materials, 1982
- Properties of amorphous hydrogenated silicon, with special emphasis on preparation by sputteringSolar Energy Materials, 1981
- Hydrogen elimination during the glow-discharge deposition of a-Si:H alloysApplied Physics Letters, 1981
- Recent developments in amorphous silicon solar cellsSolar Energy Materials, 1980
- Characterized of glow-discharge deposited a-Si:HSolar Energy Materials, 1980
- Structure of Amorphous Silicon and Silicon HydridesPhysical Review Letters, 1980
- Proton Magnetic Resonance Spectra of Plasma-Deposited Amorphous Si: H FilmsPhysical Review Letters, 1980
- Microstructure of plasma-deposited a-Si : H filmsApplied Physics Letters, 1979
- Sputtered hydrogenated amorphous siliconJournal of Electronic Materials, 1979
- (Invited) Characterization of Plasma-Deposited Amorphous Si: H Thin FilmsJapanese Journal of Applied Physics, 1979