A deep-submicrometer microwave/digital CMOS/SOS technology
- 1 January 1991
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Electron Device Letters
- Vol. 12 (1), 16-17
- https://doi.org/10.1109/55.75683
Abstract
0.35- mu m complementary metal-oxide-semiconductor (CMOS)/silicon-on-sapphire (SOS) n- and p-channel MOSFETs with a metal-over-polysilicon T-gate structure for monolithic microwave integrated circuit (MMIC) and digital applications are reported. The measured values for the current-gain cutoff frequency f/sub T/ were >or=20 GHz for both n-channel and p-channel devices, and the values for the unilateral power-gain cutoff frequency f/sub max/ were 37 GHz for the p-channel and 53 GHz for the n-channel MOSFETs. The low effective resistance of the T-gate structure contributed to the very high f/sub max/ values. It is believed that these are the highest f/sub T/ and f/sub max/ values ever reported for MOS devices. The potential of SOS submicrometer MOSFETs for microwave circuit applications is demonstrated.Keywords
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