Low pressure chemical vapor deposition of molybdenum oxides from molybdenum hexacarbonyl and oxygen
- 1 April 1995
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 259 (1), 5-13
- https://doi.org/10.1016/0040-6090(94)06427-x
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Photochromism induced in an electrolytically pretreated Mo03 thin film by visible lightNature, 1992
- Reactive sputtering of molybdenumThin Solid Films, 1990
- Oriented films of molybdenum trioxideThin Solid Films, 1990
- New unsupported 61009-oriented MoO3 catalysts I. Preparation and characterizationJournal of Catalysis, 1989
- Structure and optical properties of MoO3 thin films prepared by chemical vapor depositionPhysica Status Solidi (a), 1988
- Synthesis and properties of thin film polymorphs of molybdenum trioxideThin Solid Films, 1987
- Gas phase depletion and flow dynamics in horizontal MOCVD reactorsJournal of Crystal Growth, 1986
- Low Temperature Silicon Epitaxy Deposited by Very Low Pressure Chemical Vapor Deposition: I . KineticsJournal of the Electrochemical Society, 1986
- The influence of surface texture on the solar absorptance of black molybdenumThin Solid Films, 1982
- Studies on Molybdenum Oxides.Acta Chemica Scandinavica, 1959