Control of internal stress of Co-Cr films deposited by facing targets sputtering
- 1 January 1990
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Magnetics
- Vol. 26 (1), 106-108
- https://doi.org/10.1109/20.50504
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Extremely high bit density recording with single-pole perpendicular headIEEE Transactions on Magnetics, 1987
- Influence of film-growth conditions on c-axis orientation in sputtered Co-Cr thin filmsJournal of Applied Physics, 1987
- The influence or argon gas pressure for sputtered Co-Cr thin film preparationJournal of Magnetism and Magnetic Materials, 1986
- Compressive stress and inert gas in Mo films sputtered from a cylindrical-post magnetron with Ne, Ar, Kr, and XeJournal of Vacuum Science and Technology, 1980
- Internal stresses in metallic films deposited by cylindrical magnetron sputteringThin Solid Films, 1979