The influence or argon gas pressure for sputtered Co-Cr thin film preparation
- 1 February 1986
- journal article
- Published by Elsevier in Journal of Magnetism and Magnetic Materials
- Vol. 54-57, 1687-1688
- https://doi.org/10.1016/0304-8853(86)90978-9
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Film structure and magnetic properties for Co-Cr sputtered filmsIEEE Transactions on Magnetics, 1984
- Perpendicular magnetic anisotropy and microstructure of sputter-deposited Co-Cr filmJournal of Magnetism and Magnetic Materials, 1983