Sensitivity and contrast of some proton‐beam resists
- 1 November 1980
- journal article
- research article
- Published by Wiley in Polymer Engineering & Science
- Vol. 20 (16), 1064-1068
- https://doi.org/10.1002/pen.760201605
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
- High-resolution, ion-beam processes for microstructure fabricationJournal of Vacuum Science and Technology, 1979
- Experimental Observations of Nearly Monodisperse Polystyrene as Negative Electron ResistsJournal of the Electrochemical Society, 1979
- Ion Beam Exposure of Resist MaterialsJournal of the Electrochemical Society, 1979
- Energy deposition functions in electron resist films on substratesJournal of Applied Physics, 1979
- Electron scattering and line profiles in negative electron resistsJournal of Vacuum Science and Technology, 1975
- Focused ion beams in microfabricationJournal of Applied Physics, 1974
- On the effect of gate oxide thickness upon the hall mobility and other magneto-electrical characteristics in most structuresSolid-State Electronics, 1974
- Monte Carlo Simulation for the Energy Dissipation Profiles of 5–20 keV Electrons in Layered StructuresJapanese Journal of Applied Physics, 1973
- Polymeric Electron Beam ResistsJournal of the Electrochemical Society, 1969
- Scattering effects in ion beam exposure of photoresist polymer filmsJournal of Physics D: Applied Physics, 1968