Built in mask (BIM) : A new way to a submicron process with high resolution and good latitude
- 31 December 1987
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 6 (1-4), 495-501
- https://doi.org/10.1016/0167-9317(87)90079-7
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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