Stochastic model for thin film growth and erosion
- 12 April 1993
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 62 (15), 1745-1747
- https://doi.org/10.1063/1.109593
Abstract
A linearized, stochastic theory of thin film growth and erosion is presented to describe the evolution of surface roughness in the case of good layer formation far from equilibrium, as is generally found in energetic growth techniques such as ion‐assisted vapor deposition. The variation of the power spectral density and root‐mean‐square roughness is studied for growth on smooth and rough substrates.Keywords
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