Ion bombardment of thin layers: The effect on the interface roughness and its x-ray reflectivity (invited)
- 1 January 1992
- journal article
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 63 (1), 1415-1419
- https://doi.org/10.1063/1.1143031
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Enhancement of the reflectivity of Mo/Si multilayer x-ray mirrors by thermal treatmentApplied Physics Letters, 1991
- Ion bombardment of X-ray multilayer coatings: Comparison of ion etching and ion assisted depositionApplied Surface Science, 1991
- Ion etching of thin W layers: enhanced reflectivity of W-C multilayer coatingsApplied Surface Science, 1991
- The application of digital techniques for electron energy spectroscopy using a retarding field analyserApplied Surface Science, 1990
- On the use of H+ and Ar+ ions for high spatial resolution depth profilingVacuum, 1990
- Smoothing of multilayer x-ray mirrors by ion polishingApplied Physics Letters, 1989
- Ion-based methods for optical thin film depositionJournal of Materials Science, 1986
- Experience With The In Situ Monitor System For The Fabrication Of X-Ray MirrorsPublished by SPIE-Intl Soc Optical Eng ,1985
- Determination Of Thickness Errors And Boundary Roughness From The Measured Performance Of A Multilayer CoatingPublished by SPIE-Intl Soc Optical Eng ,1985
- Molybdenum-silicon multilayer mirrors for the extreme ultravioletApplied Optics, 1985